Coating device, in particular for Radical Enhanced Atomic Layer Deposition
DE102016007536A1
Coating device, in particular for atomic layer deposition
DE102015005724A1
Holding device and piezoelectric crystal for measuring layer thickness, in particular for atomic layer despositin
DE102013020106A1
Reaction chamber especially for Atomic Laver deposition
DE102011121078A1
Cyclic evaporation process
DE102011104132B3
Plasma assisted atomic layer deposition useful for forming thin layer on substrate, in reaction zone, comprises carrying out coating cycles, rinsing reaction area and converting adsorbed fraction of layer-forming process gas into thin layer
DE102010045046A1
Cylindrical precursor container for vaporizer used for e.g. atomic layer deposition method, has pressure spring that presses valve temple with sealing disc on inner end of inner pipe and closes steam and precursor exits and air inlet
DE102010006191A1
Producing metal acetylide compound, useful e.g. as starting compound for producing vaporizable metal compound, comprises reacting metal oxide or metal carbonate with alkyne, in presence of acid that is reactive with metal oxide
DE102010004181A1
New metal carboxylate complex with alkyne ligand that is present in alkyne or vinylidene form, useful as vaporizable precursor for metal- or metal oxide deposition, preferably chemical vapor deposition or atomic layer deposition
DE102009059799A1
New vaporizable copper carboxylate-amine complex comprising a copper carboxylate and a polyamine, useful as copper precursor for atomic layer- and chemical vapor-deposition coating process, and to produce electronic or optical component
DE102009059800A1
Method of using a volatile metal compound to form metal-containing layer on a substrate within a reaction zone under the use of an agent for the formation or storage and for supplying two process gases and agent for tempering the substrate
DE102008030900A1
Vaporizable silver carboxylate-amine complexes as silver precursors and evaporation processes for same
DE102008024530A1
Flow restrictor for use in evaporator utilized in semiconductor applications to restrict flow of e.g. process gas, has surface mount valve, where throttle stages are formed for making flow speed to reach ultrasonic within restrictor
DE102007024334A1
Optical measuring device for commercial fiber optic spectrometer, has measuring beam paths located symmetric to plane such that beam bundles exhibit common detection beam path to measure reflection and transmission of object in plane
