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EIWEISS KK

Overview
  • Total Patents
    29
  • GoodIP Patent Rank
    207,315
About

EIWEISS KK has a total of 29 patent applications. Its first patent ever was published in 1995. It filed its patents most often in Japan. Its main competitors in its focus markets environmental technology are NORTHERN ENGINEERING & TECHNOLOGY CORPRATION MCC, KOROLEV S I and YE WENMING.

Patent filings in countries

World map showing EIWEISS KKs patent filings in countries
# Country Total Patents
#1 Japan 29

Patent filings per year

Chart showing EIWEISS KKs patent filings per year from 1900 to 2020

Focus industries

Focus technologies

Top inventors

# Name Total Patents
#1 Miki Sadao 15
#2 Mino Kazuya 10
#3 Ito Atsushi 9
#4 Kuzuha Noboru 6
#5 Sasaki Yuichi 4
#6 Nagata Tomoaki 2
#7 Yamaguchi Kazuo 1
#8 Yamamoto Tamotsu 1
#9 Noguchi Takuya 1
#10 Tanigawa Kazumi 1

Latest patents

Publication Filing date Title
JP2018062493A Compound and photo-base generator composed of the compound
JP2016204283A Novel compound, photo-base generator, and method for producing novel compound
JP2016160225A Method for forming basic compound, and basic compound obtained by the method
JP2015061823A Compound and photobase generator comprising the compound
JP2014237597A Compound and photo-base generator consisting of the compound
JP2014237598A Compound and photo-base generator consisting of the compound
JP2014162778A Compound, method of producing the same and photobase generator composition
JP2014134570A Photo base generator composition
JP2014125447A Compound and photodetachment protective agent comprising the same
JP2014058473A Compound and photo-elimination protective agent comprising the same
JP2013121996A Photobase generator, resist-pattern forming material and method for preparing resist
JP2012046435A New compound, photoacid generator, and photosensitive resin composition
JP2011195616A Photocurable resin composition
JP2011184327A Method for producing acylsilane
JP2009079021A Novel compound, photoelectron-donating compound and photoacid generator containing them
JP2007217327A Photoacid generator and photosensitive resin composition
JP2006321770A 1,1-dimethylpropyloxycarbonyl group-containing compound and utilization thereof
JP2006151897A Photoacid generator and photosensitive resin composition
JP2006104175A Aesculetin derivative
JP2005213153A Alkoxysilyl group-containing compound, method for producing the same and utilization thereof