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E&R ENG CORP

Overview
  • Total Patents
    17
  • GoodIP Patent Rank
    100,218
About

E&R ENG CORP has a total of 17 patent applications. Its first patent ever was published in 2015. It filed its patents most often in Taiwan, China and United States. Its main competitors in its focus markets semiconductors, machine tools and optics are LEI WEI-SHENG, KOREA SEMICINDUCTOR SYSTEM CO LTD and MFG INTEGRATION TECHNOLOGY LTD.

Patent filings in countries

World map showing E&R ENG CORPs patent filings in countries
# Country Total Patents
#1 Taiwan 10
#2 China 4
#3 United States 3

Patent filings per year

Chart showing E&R ENG CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Chung Cho Chun 7
#2 Huang Wen-Han 4
#3 Wu Wen Ren 4
#4 Changjian Shiang-Kuo 2
#5 Chu Yu Min 2
#6 Wu Wen-Ren 2
#7 Chung Cho-Chun 2
#8 Liu Tai Chih 2
#9 Hon Schang-Jing 2
#10 Lin You-Chen 1

Latest patents

Publication Filing date Title
CN111515992A Automatic change arm and change mechanism
CN110883020A Mold cleaning machine
TWI715138B Bessel laser system with variable zoom mechanism
TWI698401B Method of making through via on glass substrate including the steps of laser processing the glass substrate, immersing the glass substrate in an etching bath, ultrasonic vibrating the etching bath to remove the transformed structure area, and continuously etching
TW202021705A Transparent substrate having hole and method for manufacturing the same in which a pulse laser beam is applied to focus on a transparent substrate positioned on a light-transmitting surface of an optic protection film to make a through hole extending through the transparent substrate
TW202022938A Slotting method for suppressing defects capable of preventing cracks generated by dividing a wafer from exceeding a metamorphic region and avoiding grain defects
TWI682493B Wafer leveling chuck structure and method thereof by applying secondary wafer leveling to enhance flatness of processed portion
TW202006867A Calibration laser printing method
TW202002048A Cutting method for preventing crack extension ensuring that cracks generated by cutting the wafer may not exceed the first metamorphic region by utilizing the first metamorphic region and avoiding grain defects
TW201726290A Dust collecting device for laser processing thereby to achieve the effect of removing the flying matters and to avoid affecting the laser cutting head contamination and further improve the cutting quality
TW201710010A Laser printing apparatus and method
TW201711120A Wafer leveling device