DYNATEC ENGINEERING AS has a total of 17 patent applications. Its first patent ever was published in 2009. It filed its patents most often in WIPO (World Intellectual Property Organization), Norway and China. Its main competitors in its focus markets materials and metallurgy, semiconductors and surface technology and coating are MEMC ELECTRONIC MAT INC, REC SILICON INC and SILIKEN CHEMICALS S L.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 5 | |
#2 | Norway | 4 | |
#3 | China | 3 | |
#4 | EPO (European Patent Office) | 2 | |
#5 | Republic of Korea | 2 | |
#6 | Singapore | 1 |
# | Industry | |
---|---|---|
#1 | Materials and metallurgy | |
#2 | Semiconductors | |
#3 | Surface technology and coating | |
#4 | Chemical engineering |
# | Technology | |
---|---|---|
#1 | Non-metallic elements | |
#2 | Semiconductor devices | |
#3 | Coating metallic material | |
#4 | Single-crystal-growth | |
#5 | Chemical or physical processes |
# | Name | Total Patents |
---|---|---|
#1 | Filtvedt Josef | 15 |
#2 | Filtvedt Werner O | 14 |
#3 | Holt Arve | 3 |
#4 | Josef Filtvedt | 2 |
#5 | Arve Holt | 1 |
Publication | Filing date | Title |
---|---|---|
CN103827030A | Reactor and method for production of silicon by chemical vapor deposition | |
WO2011065839A1 | Reactor and method for production of silicon | |
WO2011053160A1 | Wafer stack carrier | |
WO2011053153A1 | Device for wafer handling | |
CN102428027A | Reactor and method for production of silicon |