|
WO2021060677A2
|
|
Aminosilane compound, and silicon-containing thin film deposition composition comprising same
|
|
KR20200086434A
|
|
Method of trifluoroiode by recycling trifluoromethane and the system thereof
|
|
KR20200064274A
|
|
Photosensitive resin composition, film and electronic device
|
|
KR20200008678A
|
|
Stripping compositions for photoresist comprising quaternary ammonium-cyclodextrin or its derivatives
|
|
KR20190105970A
|
|
SiC Precursor Compound and Thin Film Forming Method Using The Same
|
|
KR20190061664A
|
|
Egative photosensitive resin composition and electronic device having organic insulating film using same
|
|
KR20190045649A
|
|
Aminosilane Precursor Compound and Thin Film Forming Method Using The Same
|
|
KR20190045648A
|
|
Organometallic compounds containing zirconium metal, the Preparation thereof, and thin film forming method using the same
|
|
KR20180120397A
|
|
Stripping compositions for photoresist
|
