| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 2 | |
| #2 | EPO (European Patent Office) | 2 | |
| #3 | Republic of Korea | 2 | |
| #4 | United States | 2 | |
| #5 | WIPO (World Intellectual Property Organization) | 2 | |
| #6 | Canada | 1 | |
| #7 | Hong Kong | 1 |
| # | Industry | |
|---|---|---|
| #1 | Macromolecular chemistry and polymers | |
| #2 | Surface technology and coating | |
| #3 | Semiconductors | |
| #4 | Engines, pumps and turbines | |
| #5 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Mochizuki Tsutomu | 10 |
| #2 | Inoue Takashi | 9 |
| #3 | Maruyama Hiroshi | 5 |
| #4 | Uetake Kazuyoshi | 4 |
| #5 | Tsutomu Mochizuki | 2 |
| #6 | Takashi Inoue | 2 |
| #7 | Kazuyoshi Uetake | 1 |
| #8 | Kimoto Hisao | 1 |
| #9 | Hiroshi Maruyama | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN101511903A | Chemical vapor deposition device and method | |
| KR20090038920A | Apparatus for chemical vapor deposition and method of chemical vapor deposition | |
| KR20070009545A | Method for improving the heat stability of films of poly-p-xylylene or derivatives thereof, and poly-p-xylylene derivatives |