Learn more

CS TECH CO LTD

Overview
  • Total Patents
    19
  • GoodIP Patent Rank
    183,874
About

CS TECH CO LTD has a total of 19 patent applications. Its first patent ever was published in 2005. It filed its patents most often in Republic of Korea, China and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, environmental technology and semiconductors are HIGHVAC CORP, DOWTY MINING MACHINERY LTD and JUNG ANG PLANT CO LTD.

Patent filings in countries

World map showing CS TECH CO LTDs patent filings in countries

Patent filings per year

Chart showing CS TECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Park Hyeon Jin 4
#2 Ban Jeong Won 3
#3 Kim Kyu-Chul 2
#4 Kim Geon Cheol 2
#5 Kim Hyun Il 2
#6 Shin Han Shuk 2
#7 Kim Hyun-Il 2
#8 Kim Kyu Chul 2
#9 Ban Jeong-Won 2
#10 Jang Seong Ho 1

Latest patents

Publication Filing date Title
KR20200042289A Powder trap apparatus in manufacturing semiconductor
KR20190138326A Shaveled laminated metal and its manufacturing method
KR20180069373A Smart led lighting apparatus using constant current type smps and control method thereof
KR20170055220A Method for waterproofing and carbonation protection of concrete structures
KR20170055204A Waterproof agent with penetrating into concrete
KR101609756B1 Heater for mo cvd processing chamber
KR101633422B1 A non-vibration portable motor
KR20150065051A electric hair dryer with fragrance remplacement filter
KR101451800B1 Air compressor for portable tire repair
KR20130081901A Pick pad for wafer
KR20130043822A Device for gas leak detection
KR101135112B1 Elevator brake system for controlling voltage down
KR101044526B1 Delineator of road
KR100928898B1 A method of producing a microporous polymer membrane and a microporous polymer membrane produced by the method
KR100911753B1 A transdermal patch and a method of producing the same
KR100668034B1 Method of formating assembly of electrode for producing plasma ion for plasma cleaning of semiconductor
KR100529719B1 Microporous composite membrane made by dry uniaxial stretching followed by surface modification process and making the same