CHOI DAI-SEUNG has a total of 16 patent applications. Its first patent ever was published in 2005. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets macromolecular chemistry and polymers, organic fine chemistry and basic materials chemistry are EHNIKEM S P A, PUBLICHNOE AKTSIONERNOE OBSHCHESTVO NIZHNEKAMSKNEFTEKHIM and TEXAS BUTADIENE & CHEM INT.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 11 | |
#2 | WIPO (World Intellectual Property Organization) | 5 |
# | Industry | |
---|---|---|
#1 | Macromolecular chemistry and polymers | |
#2 | Organic fine chemistry | |
#3 | Basic materials chemistry | |
#4 | Chemical engineering | |
#5 | Optics | |
#6 | Machines |
# | Name | Total Patents |
---|---|---|
#1 | Choi Dai-Seung | 16 |
#2 | Chun Sung-Ho | 16 |
#3 | Yoo Dong-Woo | 13 |
#4 | Kim Heon | 11 |
#5 | Kang Yu-Chan | 6 |
#6 | Hong Sung-Don | 5 |
#7 | Jung Hye-Young | 5 |
#8 | Won Young-Chul | 4 |
#9 | Lee Jung-Min | 3 |
#10 | Lee Hee-Jean | 2 |
Publication | Filing date | Title |
---|---|---|
US2012015116A1 | Photoreactive polymer and preparation method thereof | |
WO2008115028A1 | Photoreactive polymer and method for preparing the same |