| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 10 | |
| #2 | WIPO (World Intellectual Property Organization) | 5 |
| # | Industry | |
|---|---|---|
| #1 | Electrical machinery and energy | |
| #2 | Measurement | |
| #3 | Semiconductors | |
| #4 | Chemical engineering | |
| #5 | Surface technology and coating | |
| #6 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Booth Jean-Paul | 15 |
| #2 | Keil Douglas L | 7 |
| #3 | Keil Douglas | 6 |
| #4 | Nagai Mikio | 3 |
| #5 | Albarede Luc | 2 |
| #6 | Kim Jung | 1 |
| #7 | Jafarian-Tehrani Seyed Jafar | 1 |
| #8 | Johnson Erik | 1 |
| #9 | Marakhtanov Alexei | 1 |
| #10 | Dhindsa Rajinder | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2010005932A2 | Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber | |
| WO2010005931A2 | Capacitively-coupled electrostatic (cce) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof | |
| US2010007362A1 | RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber |