| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Taiwan | 6 | |
| #2 | WIPO (World Intellectual Property Organization) | 4 | |
| #3 | EPO (European Patent Office) | 2 | |
| #4 | Republic of Korea | 2 | |
| #5 | Singapore | 2 | |
| #6 | United States | 2 | |
| #7 | Canada | 1 |
| # | Industry | |
|---|---|---|
| #1 | Environmental technology | |
| #2 | Semiconductors | |
| #3 | Materials and metallurgy | |
| #4 | Chemical engineering | |
| #5 | Basic materials chemistry |
| # | Technology | |
|---|---|---|
| #1 | Reduction of greenhouse gas emissions | |
| #2 | Semiconductor devices | |
| #3 | Non-metallic elements | |
| #4 | Separation | |
| #5 | Water treatment | |
| #6 | Materials for miscellaneous applications |
| # | Name | Total Patents |
|---|---|---|
| #1 | Dove Curtis | 12 |
| #2 | Balooch Mehdi | 12 |
| #3 | Singh Baljit | 8 |
| #4 | Bauer Greg | 8 |
| #5 | Dove Curtis Douglas | 4 |
| #6 | Chang Goang-Cheng | 4 |
| #7 | Tesnado Eduard Gil Paran | 4 |
| #8 | Curtis Douglas Dove | 3 |
| #9 | Hu Jackson | 3 |
| #10 | Hsu Wei-Hsuan | 2 |
| Publication | Filing date | Title |
|---|---|---|
| TW201442944A | Method for manufacturing high purity sulfuric acid | |
| SG194085A1 | Low temperature deposition of silicon oxide films | |
| WO2011152973A1 | Texturing of multi-crystalline silicon substrates | |
| WO2011146206A1 | Improved chemistries for the texturing of silicon substrates | |
| WO2011094127A2 | Texturing and damage etch of silicon single crystal (100) substrates | |
| KR20120011006A | Methods for damage etch and texturing of silicon single crystal substrates |