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APPLIED VACUUM COATING TECHNOL

Overview
  • Total Patents
    13
About

APPLIED VACUUM COATING TECHNOL has a total of 13 patent applications. Its first patent ever was published in 2000. It filed its patents most often in United States, Taiwan and Japan. Its main competitors in its focus markets optics, electrical machinery and energy and surface technology and coating are VIRATEC THIN FILMS INC, FUJIAN SUBSTANCE STRUCTURE INS and AGC FLAT GLASS NA INC.

Patent filings in countries

World map showing APPLIED VACUUM COATING TECHNOLs patent filings in countries
# Country Total Patents
#1 United States 7
#2 Taiwan 4
#3 Japan 2

Patent filings per year

Chart showing APPLIED VACUUM COATING TECHNOLs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Chu Jau-Jier 5
#2 Ju Jau-Jie 4
#3 Lee I-Wen 2
#4 Shu Choketsu 2
#5 Chu Tzu-Wen 2
#6 Li Jau-Sung 2
#7 Lee Jau-Sung 2
#8 Weng Chien-Min 2
#9 Si Seitei 1
#10 Chang Shao Chi 1

Latest patents

Publication Filing date Title
US2010101937A1 Method of fabricating transparent conductive film
TW200639263A Method for sputter-coating multilayer film on sheet work-piece at low temperature
US2005082166A1 Cathode structure for vacuum sputtering machine
TW562736B Multilayer antireflection coating with a transparent conductive layer
US6478932B1 Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface
JP2003004902A Antireflective conductive multilayered thin film having transparent conductive film as outermost layer
TWI291567B Anti-reflective optical multi-layered thin film with transparent conductive film with high refractivity as an outermost layer
US6532112B2 Anti-reflection conducting coating
US6586101B2 Anti-reflection coating with transparent surface conductive layer
US6441964B1 Anti-reflection high conductivity multi-layer coating for flat CRT products
US6337771B1 Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating
TW513487B Method for producing anti-reflection plated film by sputtering and wet-type plated film