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APPLIED MICROSTRUCTURES INC

Overview
  • Total Patents
    44
  • GoodIP Patent Rank
    218,230
About

APPLIED MICROSTRUCTURES INC has a total of 44 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Taiwan. Its main competitors in its focus markets surface technology and coating, micro-structure and nano-technology and machines are POLAR MATERIALS INC, INNOVATION CHEMICAL TECHNOLOGI and GVD CORP.

Patent filings per year

Chart showing APPLIED MICROSTRUCTURES INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kobrin Boris 40
#2 Nowak Romuald 35
#3 Chinn Jeffrey D 35
#4 Yi Richard C 26
#5 Grimes Michael T 6
#6 Hirji Dangaria Nikunj 2
#7 Ashurst William R 2
#8 Romuald Nowak 2
#9 Boris Kobrin 2
#10 Janeiro Benigno A 2

Latest patents

Publication Filing date Title
WO2013176986A2 Vapor delivery apparatus
WO2008156604A1 Vapor-deposited biocompatible coatings which adhere to various plastics and metal
US2010068489A1 Wear-resistant, carbon-doped metal oxide coatings for MEMS and nanoimprint lithography
US2008248263A1 Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
US2006088666A1 Controlled vapor deposition of biocompatible coatings over surface-treated substrates
KR20060073926A Controlled vapor deposition of multilayered coating adhered by an oxide layer
US2006201425A1 Precursor preparation for controlled deposition coatings
US2005271810A1 High aspect ratio performance coatings for biological microfluidics
US2005271893A1 Controlled vapor deposition of multilayered coatings adhered by an oxide layer
CN1735708A Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
KR20050044797A Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
US2005271809A1 Controlled deposition of silicon-containing coatings adhered by an oxide layer
TW200500487A Apparatus and method for controlled application of reactive vapors to produce thin films and coatings