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AIR LIQUIDE AMERICAN

Overview
  • Total Patents
    446
  • GoodIP Patent Rank
    35,421
  • Filing trend
    ⇩ 66.0%
About

AIR LIQUIDE AMERICAN has a total of 446 patent applications. It decreased the IP activity by 66.0%. Its first patent ever was published in 1985. It filed its patents most often in United States, EPO (European Patent Office) and Canada. Its main competitors in its focus markets environmental technology, semiconductors and measurement are IWATANI CORP, IWATANI INT CORP and WONIK MAT CO LTD.

Patent filings per year

Chart showing AIR LIQUIDE AMERICANs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Pallem Venkateswara R 29
#2 Wang Hwa-Chi 23
#3 Dussarrat Christian 21
#4 Marin Ovidiu 21
#5 Hoffman Joe G 18
#6 Philippe Louis C 17
#7 Joshi Mahendra L 17
#8 Jacksier Tracey 16
#9 Charon Olivier 16
#10 Gupta Rahul 15

Latest patents

Publication Filing date Title
US10822673B1 Arsenic removal from lead concentrate by ozone treatment and reverse flotation
US10629451B1 Method to improve profile control during selective etching of silicon nitride spacers
US2018277387A1 Gases for low damage selective silicon nitride etching
US2019003706A1 Furnace with integrated heat recovery utilizing radiative recuperator for preheating combustion reactants using heat from flue gas
US2019185335A1 Aluminum hydroxide coagulant recovery from water/wastewater treatment sludge
US2019131140A1 Hydrofluorocarbons containing —NH2 functional group for 3D NAND and DRAM applications
US2019085060A1 Cell culture additives and their use for increased bioprotein production from cells
US2018215641A1 Enhanced waste heat recovery using a pre-reformer combined with oxygen and fuel pre-heating for combustion
US2017178923A1 Iodine-containing compounds for etching semiconductor structures
US2017240193A1 Adjustable cylinder bracket
US2016314962A1 Cyclic organoaminosilane precursors for forming silicon-containing films and methods of using the same
US2016108064A1 Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications
US9701695B1 Synthesis methods for amino(halo)silanes
US2016115593A1 Amino(iodo)silane precursors for ALD/CVD silicon-containing film applications and methods of using the same
US2018355483A1 Organosilane precursors for ALD/CVD silicon-containing film applications and methods of using the same
US2015371869A1 Nitrogen-containing compounds for etching semiconductor structures
US2015270140A1 Atomic layer or cyclic plasma etching chemistries and processes
US10217681B1 Gases for low damage selective silicon nitride etching
US9382268B1 Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applications
US2015184855A1 Method and burner using the curie effect for controlling reactant velocity for operation in pre-heated and non-pre-heated modes